CHARACTERIZATION OF PLASMA POLYMERIZED THIN FILMS DEPOSITED FROM HEXAMETHYLDISILOXANE USING (PECVD) METHOD

Hisham M. Abourayana; Nuri A. Zreiba; Abdulkader M. Elamin

doi:10.66411/jer.v8i8.157

Authors

Hisham M. Abourayana Materials and Metallurgical Engineering Department, Al Fateh University, Tripoli - Libya Author
Nuri A. Zreiba Materials and Metallurgical Engineering Department, Al Fateh University, Tripoli - Libya Author
Abdulkader M. Elamin National Bureau for Research and Development, Plasma Research Laboratory, Tripoli - Libya Author

DOI:

https://doi.org/10.66411/jer.v8i8.157

Keywords:

Plasma, Protective efficiency, Transmittance, Film roughness, PECVD, Contact angle, Precursor, Polymerization

Abstract

Organic polymer thin films have been deposited on glass and aluminum alloy type 6061 substrates at room temperature and different radio frequency (r.f.) powers by plasma enhanced chemical vapor deposition (PECVD) method, using hexamethyldisiloxane (HMDSO) as organic precursor. Surface properties were characterized by scanning electron microscopy (SEM) and contact angle measurements. The SEM images indicate that the surface roughness decrease with increasing r.f. power, and the results of contact angle measurements indicated that the films deposited at the r.f. power 50 and 100 watt is hydrophilic while the one prepared at 150 watt is slightly hydrophobic (θ > 90º). On the other hand, chemical properties were characterized by means of fourier transformed infrared spectroscopy (FTIR). The results indicated that, with the increase of r.f. power, the concentration of hydrogen in the film increases, while the concentration of oxygen decreases. The corrosion protective abilities of films deposited on aluminum alloy type 6061 as a substrate were examined by potentiodynamic polarization measurements in 3.5 wt. % NaCl solutions. The experimental results show that HMDSO films provided increased corrosion protective abilities with the increase of r.f. power

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